MiniLab 060 systems are floor-standing vacuum evaporators for metal, dielectric and/or organics thin-film deposition. All systems contain a box-type stainless-steel process chamber with front door for loading/unloading. A turbomolecular pumping system is standard, for high-vacuum base pressures of better than 5 × 10-7 mbar. The unit is fitted with high-stability, industrial-grade PLC electronics. User operation is via a 7” touchscreen HMI or integrated PC. Exact configuration is extremely flexible and dependent on customer budgets and applications.
Key Features and Benefits
♦ Process chamber can be equipped with load-load
♦ Substrate stages up to 11” diameter with optional rotation, heating, cooling, bias, Z-shift and source/substrate shutters
♦ Complementary techniques like etching, annealing and ion-beam sources
Techniques
♦ Magnetron Sputtering, E-Beam Evaporation, Thermal Evaporation and Low-Temperature Evaporation
♦ Metals, Dielectrics and organics deposition
♦ Automatic, manual, sequential and co-deposition
About Moorfield
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
Why Moorfield?
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research
♦ needs
♦ Multiple platforms and infinite options
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